Available Models

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Model No. Wafer Size Nominal Thickness Part Number Quantity
FTS Recertification 100 mm, 125 mm, 150 mm, 200 mm and 300 mm all values N/A
FTS12-10100 300 mm 1010 nm 959_VLSI
FTS12-6750 300 mm 675 nm 953_VLSI
FTS12-4000 300 mm 400 nm 945_VLSI
FTS12-2000 300 mm 200 nm 946_VLSI
FTS12-1000 300 mm 100 nm 958_VLSI
FTS12-500 300 mm 50 nm 957_VLSI
FTS12-120 300 mm 12 nm 955_VLSI
FTS12-250 300 mm 25 nm 956_VLSI
FTS12-75 300 mm 7.5 nm 954_VLSI
FTS12-45 300 mm 4.5 nm 952_VLSI
FTS12-20 300 mm 2 nm 1219_VLSI
FTS8-10100 200 mm 1010 nm 795_VLSI
FTS8-6750 200 mm 675 nm 292_VLSI
FTS8-4000 200 mm 400 nm 290_VLSI
FTS8-2000 200 mm 200 nm 287_VLSI
FTS8-1000 200 mm 100 nm 284_VLSI
FTS8-500 200 mm 50 nm 291_VLSI
FTS8-250 200 mm 25 nm 288_VLSI
FTS8-120 200 mm 12 nm 285_VLSI
FTS8-75 200 mm 7.5 nm 737_VLSI
FTS8-45 200 mm 4.5 nm 765_VLSI
FTS8-20 200 mm 2 nm 1230_VLSI
FTS6-10100 150 mm 1010 nm 794_VLSI
FTS6-6750 150 mm 675 nm 282_VLSI
FTS6-4000 150 mm 400 nm 280_VLSI
FTS6-2000 150 mm 200 nm 277_VLSI
FTS6-1000 150 mm 100 nm 274_VLSI
FTS6-500 150 mm 50 nm 281_VLSI
FTS6-250 150 mm 25 nm 278_VLSI
FTS6-120 150 mm 12 nm 275_VLSI
FTS6-75 150 mm 7.5 nm 736_VLSI
FTS6-45 150 mm 4.5 nm 764_VLSI
FTS5-10100 125 mm 1010 nm 793_VLSI
FTS5-6750 125 mm 675 nm 272_VLSI
FTS5-4000 125 mm 400 nm 270_VLSI
FTS5-2000 125 mm 200 nm 267_VLSI
FTS5-1000 125 mm 100 nm 264_VLSI
FTS5-500 125 mm 50 nm 271_VLSI
FTS5-250 125 mm 25 nm 268_VLSI
FTS5-120 125 mm 12 nm 265_VLSI
FTS5-75 125 mm 7.5 nm 735_VLSI
FTS5-45 125 mm 4.5 nm 763_VLSI
FTS4-10100 100 mm 1010 nm 792_VLSI
FTS4-6750 100 mm 675 nm 262_VLSI
FTS4-4000 100 mm 400 nm 260_VLSI
FTS4-2000 100 mm 200 nm 257_VLSI
FTS4-1000 100 mm 100 nm 254_VLSI
FTS4-500 100 mm 50 nm 261_VLSI
FTS4-250 100 mm 25 nm 258_VLSI
FTS4-120 100 mm 12 nm 255_VLSI
FTS4-75 100 mm 7.5 nm 734_VLSI
FTS4-45 100 mm 4.5 nm 762_VLSI

Model Number Information for Silicon Dioxide Film Thickness
Film Thickness Standards are used to calibrate optical film thickness measurement instruments such as ellipsometers, reflectometers and spectrophotometers. The certified measurand is derived film thickness for fixed index of refraction 1.46 using a single layer, transparent, homogenous calculation model. Silicon Dioxide Film Thickness Standards are traceable to SI units through NIST and NVLAP accredited under NVLAP Lab Code 200303-0.

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