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| Pictured is a 200 mm Silicon Nitride Film Thickness Standard. The certified area at its center, is an ample 10 mm in diameter. |
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NOURISH YOUR THIN FILM MEASUREMENT. Use the Silicon Nitride Film Thickness Standard (NFTS) to verify the accuracy of single wavelength or spectroscopic ellipsometers (SWE or SE) and reflectometers. Monitor long term reflectometer or ellipsometer stability in support of ISO and TS accreditation programs, and eliminate the unwanted effects of airborne molecular contamination (AMC) on your metrology.
Silicon Nitride Film Thickness Standards (NFTS) Product Description
The Nitride Film Thickness Standard from VLSI Standards consists of a silicon wafer which has a uniform, PECVD deposited silicon nitride film on the polished surface. The silicon nitride wafer meets all SEMI Standard specifications according to M1 - 9X for Polished Monocrystalline Silicon Wafers. The certified area of the nitride film thickness standard is located within a 10 mm diameter from the center of the wafer. Available silicon nitride film wafer sizes include, 100 mm, 125 mm, 150 mm and 200 mm.
The certified and traceable value is the thickness of the silicon nitride film. This value of the nitride film thickness is determined with spectroscopic ellipsometer (SE) over the wavelength range of 400 nm through 700 nm using a single layer film model with the refractive index and extinction coefficient of the silicon substrate chosen to match the values stated by NIST. The spectroscopic ellipsometer calibration standards used for such certifications is calibrated using NIST Standard Reference Materials 2532 and 2533.
Silicon Nitride Film Thickness Standards (NFTS) Product Specifications
- SEMI Specification Silicon Wafers
100, 125, 150, and 200 mm diameter wafers
- Available Silicon Nitride Thicknesses
20, 90, 120 and 200 nm.
- Traceability
SI Units through NIST
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