Above is a 2µm FOV CD-SEM micrograph of a NanoLattice Standard.   Above image shows a 300 mm wafer with the Nanolattice die mounted in an X-Y configuration.                             2002 Micro Magazine              Top 25 Product All-Stars SET THE SCALE FOR ADVANCED LITHOGRAPHY. The NanoLattice™ (NLSM) 100 nm pitch standard utilizes gratings with near perfect periodicity to calibrate magnification and scan linearity of CD-SEM and Atomic Force Microscopes (AFM). Make the grade for advance lithography, with the only pitch standard of its kind available below the 130 nm node. NanoLattice Pitch Standard (NLSM) Product Description The NanoLattice pitch standard is a 1.2 mm x 1 mm etched silicon grating with a nominal pitch of 100 nm. Each grating is continuous over a large certified area, permitting tens of thousands of measurements. Global alignment marks located 25 mm from the center of wafer on both sides of the NanoLattice pitch standard chip can be used to assist pattern recognition and automation. Each NanoLattice pitch standard is individually mounted on a carrier wafer, compatible with 200 mm and 300 mm wafer handlers. NanoLattice Pitch Standard (NLSM) Product Specifications Substrate 200 and 300 Silicon wafers Certified Pitch Values 100 nm, 200 nm, 400 nm, 800 nm, 1000 nm Uncertainty of 100 nm Pitch Metrology < 1 nm Nominal Pitch Value 100 nm ± 2 nm Material Silicon <100> Pattern Defect Density Less than 1 defect size > 0.2 µm per 50 image frames of size 1.5 µm x 1.5 µm Certified Area 800 µm x 800 µm Traceability Traceable to a pitch master standard measured by NIST